Kansai Photon Science Institute 　　| 　　The 8th KPSI Seminar Stress dynamics of ultra-short pulsed laser processing inside transparent materials

Kansai Photon Science Institute >> KPSI Seminar >> Stress dynamics of ultra-short pulsed laser processing inside transparent materials

Seminar

The 8th KPSI Seminar

Stress dynamics of ultra-short pulsed laser processing inside transparent materials

Ultra-short pulsed laser processing inside transparent materials has been applied to fabrication of various three-dimensional structures such as 3D micro-channels and photonics circuits. Precise micro-processing using ultra-short pulsed laser has often been explained in terms of “photoexcitation in much shorter time than thermal diffusion time” or “non-thermal processing”. In many cases, these words are used without knowing their physical meanings, and at worse the sentence “non-thermal processing” sometimes leads to incorrect understanding of the laser processing such as “processing without temperature elevation or thermal energy”.

The speaker has investigated the stress dynamics after photoexcitation by a focused ultra-short laser pulse inside various transparent materials to elucidate the mechanism of the structural changes. In this talk, the speakers will review the fundamental and applications of ultra-short pulsed laser processing inside transparent materials and the investigation of the speaker, the observation of stress dynamics after photoexcitation and control of structural changes and transient stress distributions by parallel laser irradiation.

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