研究発表(2020年度)
査読付き論文
- H. Yamamoto, G. Dawson, T. Kozawa, A. P.G. Robinson
「Lamellar orientation of a block copolymer via an electron-beam induced polarity switch in a nitrophenyl self-assembled monolayer」Quantum. Beam Sci. 4 12 1-10 (2020) - M. Ishino , T. Dinh , Y. Hosaka , N. Hasegawa , K. Yoshimura , H. Yamamoto , T. Hatano , T. Higashiguchi , K. Sakaue , S. Ichimaru , M. Hatayama , A. Sasaki , M. Washio , M. Nishikino , Y. Maekawa「Soft x-ray laser beamline for surface processing and damage studies」Applied Optics 59 3692-3698 (2020)
研究発表(2019年度)
査読付き論文
- Yuji Hosaka, Tomoko Gowa Oyama, Hiroki Yamamoto, Masahiko Ishino, Thanh-Hung Dinh, Masaharu Nishikino, and Yasunari Maekawa, Sensitivity enhancement of poly(methyl methacrylate) upon exposure to picosecond-pulsed extreme ultraviolet, Applied Physics Letters 115, 073109 (2019).
- A. Sasaki, M. Ishino and M. Nishikino, An estimation of line width roughness of photoresists due to photon shot noise for extreme ultraviolet lithography using the percolation model, Japanese Journal of Applied Physics 58, 055002 (2019).
- N. Nishimori, R. Nagai, R. Hajima, M. Yamamoto, Y. Honda, T. Miyajima, and T. Uchiyama, Operational experience of a 500 kV photoemission gun, Phys. Rev. Accel. Beams 22, 053402 (2019).
- H. Kudo, M. Fukunaga, T. Yamada, T. Watanabe, H. Yamamoto, K. Okamoto, and Takahiro Kozawa, Synthesis and Property of Tellurium-Containing Molecular Resist Materials for Extreme Ultraviolet Lithography System, J. Photopolym. Sci. Technol., 6 805-810 (2019).
プロシーディングス等
- A. Sasaki. Simulation of statistical effects in exposure and development of EUV photoresists using the percolation and diffusion limited aggregation mode. Proc. SPIE 10957, Advances in Patterning and Processes XXXV, 109571Q (2019).
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T. Obina, D.A. Arakawa, M. Egi, T. Furuya, K. Haga, K. Harada, T. Honda, Y. Honda, T. Honma, E. Kako, R. Kato, H. Kawata, Y. Kobayashi, Y. Kojima, T. Konomi, H. Matsumura, T. Miura, T. Miyajima, S. Nagahashi, H. Nakai, N. Nakamura, K. Nakanishi, K.N. Nigorikawa, T. Nogami, F. Qiu, H. Sagehashi, H. Sakai, S. Sakanaka, M. Shimada, M. Tadano, T. Takahashi, R. Takai, O.A. Tanaka, Y. Tanimoto, T. Uchiyama, K. Umemori, M. Yamamoto, R. Hajima, R. Nagai, M. Sawamura, N. Nishimori, 1 mA Stable Energy Recovery Beam Operation with Small Beam Emittance, Proceedings of the 10th International Particle Accelerator Conference (IPAC-2019), pp.1482-1485, 19-24 May, 2019, Melbourne, Australia. DOI: 10.18429/JACoW-IPAC2019-TUPGW036.
解説記事
- 保坂勇志、大山智子、電子線を用いたEUVレジスト感度予測法の研究、放射線化学107, 3-8 (2019).
- 山本洋揮、放射線化学によるポリマーフィルムへの金属ナノパターン形成、放射線化学107, 59-63 (2019).
- 山本洋揮、リソグラフィと放射線、放射線と産業147, 32-37 (2019).
研究発表(2018年度)
査読付き論文
- H. Yamamoto, Y. Vesters, J. Jiang, D. De Simone, G. Vandenberghe, and T. Kozawa
「Role of Metal Sensitizers for Sensitivity Improvement in EUV Chemically Amplified Resist」J. Photopolym. Sci. Technol. 31 747-751 (2018).