量子材料超微細加工プロジェクト

研究発表

掲載日：2026年6月1日更新
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2026

  1. Atomic and electronic structure of ZrO2 film on Si(100) grown by low temperature chemical vapor deposition
    S. Entani, S. Hattori, M. Honda, M. Kohda, and H. Yamamoto​
    AIP advances 16 (2026) 055021. Doi:10.1063/6.0005054.

  2. Effect of component of cinnamic acid-stabilized ZrO2 nanoparticle resists on resist performance for EB and EUV lithography
    T. Hamada, S, Shimoda, and H. Yamamoto
    Jpn. J. Appl. Phys., 65 (2026) 06SP27. DOI:10.35848/1347-4065/ae4d53.

2025

  1. Evaluation of Inorganic-organic Hybrid Resist Materials with Ultrafast Coherent High Harmonic Generation (HHG) EUV system Developed in QST.
    H. Yamamoto, T.-H.- Dinh, T. Kozawa, S. Namba, and M. Ishino​
    J. Photopolym. Sci. Technol., 38 (2025) 217-221, DOI:10.2494/photopolymer.38.217.

  2. Effect of organic ligand and metal nanocluster core structure on resist performance of inorganic-organic hybrid resist materials for EUV and EB lithography.
    H. Yamamoto, T. Hamada, Y. Muroya, K. Okamoto, S. Shimoda and T. Kozawa
    Jpn. J. Appl. Phys., 64 (2025) 03SP42. DOI:10.35848/1347-4065/adba6c.

2024

  1. Synthesis of Polystyrene-block-poly (3-hydroxy-1-methacryloyloxyadamantane) (PS-b PHAdMA) via RAFT polymerization as candidate block copolymers for next generation lithography.
    H. Yamamoto, F. McCallum, H. Peng, I. Blakey, S. Hasegawa, Y. Maekawa, T. Kozawa, and A. K. Whittaker​
    Polymer, 318 (2024) 127983-1- 127983-9. DOI:10.1016/j.polymer.2024.127983.

  2. A study on the resist performance of inorganic-organic resist materials for EUV and electron beam lithography.
    H. Yamamoto, Y. T. Ito, K. Okamoto, S. Shimoda, and T. Kozawa​
    Jpn. J. Appl. Phys., 63 (2024) 04SP87-1 - 04SP87-6. DOI:10.35848/1347-4065/ad38c5. 

  3. Transient Swelling During Development of Poly(methyl methacrylate) Resist.
    A. Konda, H. Yamamoto, S. Yoshitake, and T. Kozawa​
    J. Photopolym. Sci. Technol., 37 (2024) 81-88. DOI:10.2494/photopolymer.37.81.

  4. Competitive coexistence of ferromagnetism and metal–insulator transition of VO2 nanoparticles.
    T. Hatano, A. Fukawa, H. Yamamoto, K. Akiba, S. Demura, and K. Takase​
    Jpn. J. Appl. Phys., 63 (2024) 04SP07-1-04SP07-4. DOI:10.35848/1347-4065/ad2d04. 

  5. Fundamental Evaluation of KrF Resist Changing Formulation by EB and EUV Exposure.
    Y. Ohta, A. Sekiguchi, S. Yamakawa, T. Harada, T. Watanabe, and H. Yamamoto​
    J. Photopolym. Sci. Technol., 37 (2024) 89-93. DOI:10.2494/photopolymer.37.89.

  6. Evaluation of Basic Behavior of Acrylic Polymer Changing Composition by KrF, ArF and EUV Exposure
    Y. Ohta, A. Sekiguchi, T. Fujiwara, S. Yamakawa, T. Harada, T. Watanabe, and H. Yamamoto​
    J. Photopolym. Sci. Technol., 37 (2024) 299-304. DOI:10.2494/photopolymer.37.299. 

2023

  1. Design of High-sensitive Resist Materials Based on Polyacetals.
    H. Maekawa, Y. Iwashige, H. Yamamoto, K. Okamoto, T. Kozawa, and H. Kudo​
    J. Photopolym. Sci. Technol., 36 (2023) 31-39. DOI:10.2494/photopolymer.36.31.

2022

  1.  Dependence of Dissolution Kinetics of Main-Chain Scission Type Resists on Molecular Weight.
     A. Konda, H. Yamamoto, S. Yoshitake, and T. Kozawa​
     J. Photopolym. Sci. Technol., 35 (2022) 1 - 7. DOI:10.2494/photopolymer.35.1. 

  2.  Comparison of Photoresist Sensitivity between KrF, EB and EUV Exposure.
    Y. Ohta, A. Sekiguchi, S. Yamakawa, T. Harada, T. Watanabe, and H. Yamamoto​ 
    J. Photopolym. Sci. Technol., 35 (2022) 49-54. DOI:10.2494/photopolymer.35.49. 

  3.  High aspect (>20) etching with reactive gas cluster injection.
    T. Seki, H. Yamamoto, K. Koike, T. Aoki, and J. Matsuo​
     Jpn. J. Appl. Phys. 61 (2022) SI1007-1-8. DOI:10.35848/1347-4065/ac6565.

2021

  1.   Study on Irradiation Effects by Femtosecond-pulsed Extreme Ultraviolet in Resist Materials.
    Y. Hosaka, H. Yamamoto, M. Ishino, T.-H.- Dinh, M. Nishikino, A. Kon, S. Owada, Y. Inubushi, Y. Kubota, and Y. Maekawa​
    J. Photopolym. Sci. Technol. 34 (2021) 95-98. DOI:10.2494/photopolymer.34.95.

2020

  1. Lamellar orientation of a block copolymer via an electron-beam induced polarity switch in a nitrophenyl self-assembled monolayer.
    H. Yamamoto, G. Dawson, T. Kozawa, A. P. G. Robinson​
    Quantum. Beam Sci. 4 (2020) 19-1-10. DOI:10.3390/qubs4020019.

  2.  Soft x-ray laser beamline for surface processing and damage studies.
    M. Ishino, T.-H.- Dinh, Y. Hosaka, N. Hasegawa, K. Yoshimura, H. Yamamoto, T. Hatano, T. Higashiguchi, K. Sakaue, S. Ichimaru, M. Hatayama, A. Sasaki, M. Washio, M. Nishikino, and Y. Maekawa​
    Applied Optics 59 (2020) 3692 - 3698. DOI:10.1364/AO.387792.

  3. Higher Sensitive Extreme Ultraviolet (EUV) Resist Materials Derived From p-t-Butylcalix[n]arenes (n = 4 and 8).
    H. Maekawa, H. Kudo, T. Watanabe, H. Yamamoto, K. Okamoto, and T. Kozawa
    J. Photopolym. Sci. Technol. 33 (2020) 45 - 51. DOI:10.2494/photopolymer.33.45. 

  4. Synthesis and Property of Tellurium-Containing Molecular Resist Materials for Extreme Ultraviolet Lithography System.
    H. Kudo, M. Fukunaga, T. Yamada, S. Yamakawa, T. Watanabe, H. Yamamoto, K. Okamoto, and T. Kozawa.​
    J. Photopolym. Sci. Technol. 32 (2020) 805-810. DOI:10.2494/photopolymer.32.805.

2019

  1. Sensitivity Enhancement of Poly(methyl methacrylate) upon Exposure to Picosecond-Pulsed Extreme Ultraviolet.
    Y. Hosaka, T. G. Oyama, H. Yamamoto, M. Ishino, T.-H.- Dinh, M. Nishikino, and Y. Maekawa
    Appl. Phys. Lett 115 (2019) 073109-1-073109-5. DOI:10.1063/1.5116284.

2018

  1. Role of Metal Sensitizers for Sensitivity Improvement in EUV Chemically Amplified Resist.
     H. Yamamoto, Y. Vesters, J. Jiang, D. De Simone, G. Vandenberghe, and T. Kozawa
    J. Photopolym. Sci. Technol. 31 (2018) 747-751. DOI:10.2494/photopolymer.31.747.

  2. Sensitizers in extreme ultraviolet chemically amplified resist: mechanism of sensitivity improvement.
    Y. Vesters, J. Jiang, H. Yamamoto, D. De Simone, T. Kozawa, S. De Gendt, G. Vandenberghe​
    J. Micro/Nanolith. MEMS. MOEMS 17 (2018) 043506-1 - 043506-8. DOI:10.1117/1.JMM.17.4.043506.

  3. Synthesis of hyperbranched polyacetals containing C-(4-t-butylbenz)calix[4]resorcinarene: Resist properties for extreme ultraviolet (EUV) lithography.
    H. Kudo, M. Fukunaga, K. Shotsuki, H. Takeda, H. Yamamoto, and T. Kozawa
    Reactive and Functional Polymers 131 (2018) 361 - 367. DOI:10.1016/j.reactfunctpolym.2018.08.013.

  4. Synthesis and Property of Tannic Acid Derivatives and Their Application for Extreme Ultraviolet Lithography System
    H. Kudo, S. Ohori, H. Ogawa, H. Yamamoto, and T. Kozawa​
    J. Photopolym. Sci. Technol. 31 (2018) 221-225. DOI:10.2494/photopolymer.31.221.

2017

  1. Synthesis of Metal Nanoparticles and Patterning in Polymeric Films induced by Electron Nanobeam.
    H. Yamamoto, T. Kozawa, S. Tagawa, M. Naito, J.-L. Marignier, M. Mostafavi, and J. Belloni​
    J. Phys. Chem. C 121 (2017) 5335-5340. DOI:10.1021/acs.jpcc.6b12543.

  2. Study on Resist Performance of Noria Derivatives Modified with Various Protection Ratios of Acetal Moieties by means of Extreme Ultraviolet Irradiation.
    H. Yamamoto, H. Kudo, and T. Kozawa​
    J. Photopolym. Sci. Technol., 30 (2017) 627-631. DOI: 10.2494/photopolymer.20.627.

  3. Fabrication of a Si lever structure made by double-angle etching with reactive gas cluster injection.
    T. Seki, H. Yamamoto, T. Kozawa, K. Koike, T. Aoki, and J. Matsuo
    Appl. Phys. Lett. 110 (2017) 182105/1-182105/4. DOI:10.1063/1.4982970.

  4. Angled etching of Si by ClF3-Ar gas cluster injection.
    T. Seki, H. Yamamoto, T. Kozawa, T. Shoji, K. Koike, T. Aoki, and J. Matsuo​
    Jpn. J. Appl. Phys. 56 (2017) 06HB02-1-06HB02-5. DOI:10.7567/JJAP.56.06HB02.

  5. Sensitivity enhancement of chemically amplified EUV resists by adding acid-generating Promoters.
    S. Fujii, K. Okamoto, H. Yamamoto, T. Kozawa, and T. Itani
    Jpn. J. Appl. Phys. 56 (2017) 06GD01-1-06GD01-6. DOI:10.7567/JJAP.56.06GD01.

  6. Formation of Au nanoparticle arrays on hydrogel two-dimensional patterns based on poly(vinylpyrrolidone).
    S. Tsukuda, K. Okamoto, H. Yamamoto, T. Kozawa, and T. Omata
    Jpn. J. Appl. Phys.  56 (2017) 06GG06-1- 06GG06-4. DOI:10.7567/JJAP.56.06GG06.
  7. Dynamics of Radical Ions of Hydroxyhexafluoroisopropyl-Substituted Benzenes.
    K. Okamoto, N. Nomura, R. Fujiyoshi, K. Umegaki, H. Yamamoto, K. Kobayashi and T. Kozawa
    J. Phys. Chem. A 121, (2017) 9458–9465. DOI:10.1021/acs.jpca.7b09842.
  8. Analysis of the relaxation process of electron-hole pairs in a-Al2O3 using transient absorption spectroscopy.
    M. Koshimizu, Y. Muroya, S. Yamashita, H. Yamamoto, Y. Fujimoto, and K. Asai
    Journal of Materials Science: Materials in Electronics 28 (2017) 7091-7094. DOI: 10.1007/s10854-017-6423-7.
量子材料超微細加工プロジェクト